{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8524094","patent":{"patent_number":"US-8524094","title":"Masking material for dry etching","assignee":null,"inventors":[],"filing_date":"2008-07-16T00:00:00.000Z","publication_date":"2013-09-03T00:00:00.000Z","cpc_codes":["B82Y","B82Y","B82Y","G11B","H01L","H01L","H01L","G11B","G11B"],"num_claims":2,"abstract":"The object of the present invention is to provide a masking material for dry etching, which is suitable for fine processing of a magnetic film as thin as a few nm such as NiFe or CoFe constituting a TMR film and capable of simplifying the process for producing a TMR element and reducing production costs related to facilities and materials. This object was solved by a masking material for dry etching of a magnetic material by using a mixed gas of carbon monoxide and a nitrogenous compound as etching gas, which comprises a metal (tantalum, tungsten, zirconium or hafnium) with a melting or boiling point increasing upon conversion thereof into a nitride or carbide."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Masking material for dry etching","description":"The object of the present invention is to provide a masking material for dry etching, which is suitable for fine processing of a magnetic film as thin as a few nm such as NiFe or CoFe constituting a T","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8524094","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8524094","citation_suggestion":"Patentable. \"Masking material for dry etching\" (US-8524094). https://patentable.app/patents/US-8524094","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8524094","json":"https://patentable.app/api/llm-context/US-8524094","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T23:56:04.270Z"}