{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8531203","patent":{"patent_number":"US-8531203","title":"Mask alignment, rotation and bias monitor utilizing threshold voltage dependence","assignee":null,"inventors":[],"filing_date":"2010-06-11T00:00:00.000Z","publication_date":"2013-09-10T00:00:00.000Z","cpc_codes":["H01L","H01L"],"num_claims":20,"abstract":"The present invention provides a method and apparatus for measuring alignment, rotation and bias of mask layers in semiconductor manufacturing by examining threshold voltage variation."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Mask alignment, rotation and bias monitor utilizing threshold voltage dependence","description":"The present invention provides a method and apparatus for measuring alignment, rotation and bias of mask layers in semiconductor manufacturing by examining threshold voltage variation.","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8531203","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8531203","citation_suggestion":"Patentable. \"Mask alignment, rotation and bias monitor utilizing threshold voltage dependence\" (US-8531203). https://patentable.app/patents/US-8531203","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8531203","json":"https://patentable.app/api/llm-context/US-8531203","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T05:40:09.625Z"}