{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8539396","patent":{"patent_number":"US-8539396","title":"Stitch and trim methods for double patterning compliant standard cell design","assignee":null,"inventors":[],"filing_date":"2012-03-09T00:00:00.000Z","publication_date":"2013-09-17T00:00:00.000Z","cpc_codes":["G06F","G06F","G06F"],"num_claims":18,"abstract":"A method for creating double patterning compliant integrated circuit layouts is disclosed. The method allows patterns to be assigned to different masks and stitched together during lithography. The method also allows portions of the pattern to be removed after the process."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Stitch and trim methods for double patterning compliant standard cell design","description":"A method for creating double patterning compliant integrated circuit layouts is disclosed. The method allows patterns to be assigned to different masks and stitched together during lithography. The me","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8539396","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8539396","citation_suggestion":"Patentable. \"Stitch and trim methods for double patterning compliant standard cell design\" (US-8539396). https://patentable.app/patents/US-8539396","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8539396","json":"https://patentable.app/api/llm-context/US-8539396","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T10:29:45.288Z"}