{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8541752","patent":{"patent_number":"US-8541752","title":"Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask","assignee":null,"inventors":[],"filing_date":"2012-12-18T00:00:00.000Z","publication_date":"2013-09-24T00:00:00.000Z","cpc_codes":["G01N"],"num_claims":21,"abstract":"A method for locally resolved measurement of a radiation distribution (24) produced using a lithography mask (16) comprises providing a radiation converter (31, 131) having an at least two-dimensional arrangement of converter elements (32, 132) which can respectively be put in an active and a passive state, and are configured to convert incoming radiation in respect of its wavelength in the active state. The method further includes: manipulating the radiation converter (31, 131) several times such that respectively only a fraction of the converter elements (32, 132) adopts the active state, irradiating the radiation converter (31, 131) with the radiation distribution (24) after every manipulation of the radiation converter (31, 131) so that the active converter elements (32, 132) emit wavelength-converted measuring radiation (34), recording respective places of origin (54) of the measuring radiation at every irradiation with the radiation distribution (24)."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask","description":"A method for locally resolved measurement of a radiation distribution (24) produced using a lithography mask (16) comprises providing a radiation converter (31, 131) having an at least two-dimensional","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8541752","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8541752","citation_suggestion":"Patentable. \"Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask\" (US-8541752). https://patentable.app/patents/US-8541752","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8541752","json":"https://patentable.app/api/llm-context/US-8541752","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T23:06:13.884Z"}