{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9588439","patent":{"patent_number":"US-9588439","title":"Information matrix creation and calibration test pattern selection based on computational lithography model parameters","assignee":null,"inventors":[],"filing_date":"2011-12-20T00:00:00.000Z","publication_date":"2017-03-07T00:00:00.000Z","cpc_codes":["G06F","H01L"],"num_claims":24,"abstract":"Embodiments of the present invention describe methods of selecting a subset of test patterns from an initial larger set of test patterns for calibrating a computational lithography model. An example method comprises: generating an information matrix for the initial larger set of test patterns, wherein the terms of the information matrix comprise one or more identified model parameters that represent a lithographic process response; and, executing a selection algorithm using terms of the information matrix to select the subset of test patterns that effectively determines values of the identified model parameters that contribute significantly in the lithographic process response, wherein the subset of test patterns characteristically represents the initial larger set of test patterns. The selection algorithm explores coverage relationships existing in the initial larger set of test patterns."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Information matrix creation and calibration test pattern selection based on computational lithography model parameters","description":"Embodiments of the present invention describe methods of selecting a subset of test patterns from an initial larger set of test patterns for calibrating a computational lithography model. An example m","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9588439","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9588439","citation_suggestion":"Patentable. \"Information matrix creation and calibration test pattern selection based on computational lithography model parameters\" (US-9588439). https://patentable.app/patents/US-9588439","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9588439","json":"https://patentable.app/api/llm-context/US-9588439","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T07:20:48.669Z"}