{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9589343","patent":{"patent_number":"US-9589343","title":"Pattern measurement device, evaluation method of polymer compounds used in self-assembly lithography, and computer program","assignee":null,"inventors":[],"filing_date":"2013-08-02T00:00:00.000Z","publication_date":"2017-03-07T00:00:00.000Z","cpc_codes":["G01N","G06F","G06T","G06T","G06T","G01N","G01N"],"num_claims":17,"abstract":"The purpose of the present invention is to provide a pattern measurement device which evaluates quantitatively and with high precision random patterns such as finger print patterns. In order to fulfill this purpose, a pattern measurement device which measures the pattern on a sample on the basis of an image acquired by a charged particle beam is proposed which selectively extracts linear or linearly approximable parts of the pattern on the sample, and outputs at least one of the following: the measurement of the distance between the extracted parts, the ratio of said extracted parts in a prescribed region, and the length of said extracted parts. Further, as a more specific embodiment, a pattern measurement device is proposed which calculates a frequency depending on a distance value between extracted parts, and outputs, as a pattern distance, distance values for which said frequency fulfills a prescribed condition."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Pattern measurement device, evaluation method of polymer compounds used in self-assembly lithography, and computer program","description":"The purpose of the present invention is to provide a pattern measurement device which evaluates quantitatively and with high precision random patterns such as finger print patterns. In order to fulfil","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9589343","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9589343","citation_suggestion":"Patentable. \"Pattern measurement device, evaluation method of polymer compounds used in self-assembly lithography, and computer program\" (US-9589343). https://patentable.app/patents/US-9589343","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9589343","json":"https://patentable.app/api/llm-context/US-9589343","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T14:40:44.896Z"}