{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9595441","patent":{"patent_number":"US-9595441","title":"Patterning a substrate using grafting polymer material","assignee":null,"inventors":[],"filing_date":"2015-12-17T00:00:00.000Z","publication_date":"2017-03-14T00:00:00.000Z","cpc_codes":["H01L"],"num_claims":18,"abstract":"Patterning methods for creating sub-resolution trenches, contact openings, lines, and other structures at smaller dimensions as compared to using conventional self-aligned multiple patterning and sequential litho-etch deposition patterning approaches. Techniques herein include patterning using a grafting polymer material that has been modified to provide little or no etch resistance (fast etching). The grafting polymer material is deposited as spacer material on a substrate having mandrels. The spacer material selectively adheres to mandrel surfaces without adhering to exposed portions of an underlying layer. The spacer material also adheres up to a specific length so that sidewall spacers are formed. Openings between spacers are filled with a filler material, and then the sidewall spacers, made of the grafting material, are etched thereby creating antispacers. Etch transfer to a memorization layer and/or using additional relief patterns can be incorporated for creating various features."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Patterning a substrate using grafting polymer material","description":"Patterning methods for creating sub-resolution trenches, contact openings, lines, and other structures at smaller dimensions as compared to using conventional self-aligned multiple patterning and sequ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9595441","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9595441","citation_suggestion":"Patentable. \"Patterning a substrate using grafting polymer material\" (US-9595441). https://patentable.app/patents/US-9595441","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9595441","json":"https://patentable.app/api/llm-context/US-9595441","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T08:59:28.071Z"}