{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9601397","patent":{"patent_number":"US-9601397","title":"Microwave probe, plasma monitoring system including the microwave probe, and method for fabricating semiconductor device using the system","assignee":null,"inventors":[],"filing_date":"2016-05-25T00:00:00.000Z","publication_date":"2017-03-21T00:00:00.000Z","cpc_codes":["G01N","H01L","H01L","H01L","H01L"],"num_claims":20,"abstract":"Disclosed herein are a microwave probe capable of precisely detecting a plasma state in a plasma process, a plasma monitoring system including the probe, and a method of fabricating a semiconductor device using the system. The microwave probe includes a body extending in one direction and a head which is connected to one end of the body and has a flat plate shape. In addition, in the plasma process, the microwave probe is non-invasively coupled to a chamber such that a surface of the head contacts an outer surface of a viewport of the chamber, and the microwave probe applies a microwave into the chamber through the head and receives signals generated inside the chamber through the head."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Microwave probe, plasma monitoring system including the microwave probe, and method for fabricating semiconductor device using the system","description":"Disclosed herein are a microwave probe capable of precisely detecting a plasma state in a plasma process, a plasma monitoring system including the probe, and a method of fabricating a semiconductor de","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9601397","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9601397","citation_suggestion":"Patentable. \"Microwave probe, plasma monitoring system including the microwave probe, and method for fabricating semiconductor device using the system\" (US-9601397). https://patentable.app/patents/US-9601397","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9601397","json":"https://patentable.app/api/llm-context/US-9601397","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T10:33:22.242Z"}