{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9601440","patent":{"patent_number":"US-9601440","title":"Method for manufacturing semiconductor device and exposure mask used in the same method","assignee":null,"inventors":[],"filing_date":"2014-03-19T00:00:00.000Z","publication_date":"2017-03-21T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L"],"num_claims":3,"abstract":"A method for manufacturing a semiconductor device is disclosed in which the probability of occurrence of a crack is reduced and in which manufacturing cost is also reduced. An exposure mask used in the method is disclosed. Protrusion portions are formed in intersections of scribe lines in an outermost periphery of a scribe line pattern of a surface protection film of the exposure mask, to thereby stick out toward an outer circumference. In this manner, the probability of occurrence of a crack occurring in a device formation section can be reduced so that a reduction in the manufacturing cost can be achieved."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for manufacturing semiconductor device and exposure mask used in the same method","description":"A method for manufacturing a semiconductor device is disclosed in which the probability of occurrence of a crack is reduced and in which manufacturing cost is also reduced. An exposure mask used in th","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9601440","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9601440","citation_suggestion":"Patentable. \"Method for manufacturing semiconductor device and exposure mask used in the same method\" (US-9601440). https://patentable.app/patents/US-9601440","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9601440","json":"https://patentable.app/api/llm-context/US-9601440","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T13:16:11.889Z"}