{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9601706","patent":{"patent_number":"US-9601706","title":"Resin composition for forming protective film, protective film, pattern forming method, method for manufacturing electronic device, and electronic device","assignee":null,"inventors":[],"filing_date":"2015-04-17T00:00:00.000Z","publication_date":"2017-03-21T00:00:00.000Z","cpc_codes":["H01L","H01L"],"num_claims":6,"abstract":"There is provided a resin composition for use in formation of a protective film to protect a substrate or a film formed on the substrate, from a developer containing an organic solvent to be used for development in pattern formation, and which contains two or more kinds of resins in which their main chain structures having a hydroxyl group are different, and contains water, a pattern forming method using the resin composition, and layered products comprising a substrate, an organic semiconductor film on the substrate, and a protective film comprising two or more kinds of resins in which their main chain structures having a hydroxyl group are different, on the organic semiconductor film."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Resin composition for forming protective film, protective film, pattern forming method, method for manufacturing electronic device, and electronic device","description":"There is provided a resin composition for use in formation of a protective film to protect a substrate or a film formed on the substrate, from a developer containing an organic solvent to be used for ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9601706","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9601706","citation_suggestion":"Patentable. \"Resin composition for forming protective film, protective film, pattern forming method, method for manufacturing electronic device, and electronic device\" (US-9601706). https://patentable.app/patents/US-9601706","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9601706","json":"https://patentable.app/api/llm-context/US-9601706","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T15:11:38.321Z"}