{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9607829","patent":{"patent_number":"US-9607829","title":"Method of surface functionalization for high-K deposition","assignee":null,"inventors":[],"filing_date":"2015-02-11T00:00:00.000Z","publication_date":"2017-03-28T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":20,"abstract":"A method of surface functionalization for high-k deposition is provided in several embodiments. The method provides interface layer growth with low effective oxide thickness and good nucleation behavior for high-k deposition. The method includes providing a substrate that is at least substantially free of oxygen on a surface of the substrate, forming an interface layer on the surface of the substrate by exposing the surface of the substrate to one or more pulses of ozone gas, modifying the interface layer by exposing the interface layer to one or more pulses of a treatment gas containing a functional group to form a functionalized interface layer terminated with the functional group, and depositing a high-k film on the functionalized interface layer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of surface functionalization for high-K deposition","description":"A method of surface functionalization for high-k deposition is provided in several embodiments. The method provides interface layer growth with low effective oxide thickness and good nucleation behavi","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9607829","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9607829","citation_suggestion":"Patentable. \"Method of surface functionalization for high-K deposition\" (US-9607829). https://patentable.app/patents/US-9607829","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9607829","json":"https://patentable.app/api/llm-context/US-9607829","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T10:55:41.249Z"}