{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9607883","patent":{"patent_number":"US-9607883","title":"Trench formation using rounded hard mask","assignee":null,"inventors":[],"filing_date":"2015-07-22T00:00:00.000Z","publication_date":"2017-03-28T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":20,"abstract":"A method embodiment includes forming a hard mask over a dielectric layer, patterning the hard mask to form an opening, forming a passivation layer on sidewalls of the opening, and forming a trench in the dielectric layer by extending the opening into the dielectric layer using an etching process. The sidewalls of the opening are etched to form a rounded profile in the hard mask and a substantially perpendicular profile in the dielectric layer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Trench formation using rounded hard mask","description":"A method embodiment includes forming a hard mask over a dielectric layer, patterning the hard mask to form an opening, forming a passivation layer on sidewalls of the opening, and forming a trench in ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9607883","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9607883","citation_suggestion":"Patentable. \"Trench formation using rounded hard mask\" (US-9607883). https://patentable.app/patents/US-9607883","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9607883","json":"https://patentable.app/api/llm-context/US-9607883","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T12:41:27.073Z"}