{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9612522","patent":{"patent_number":"US-9612522","title":"Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor","assignee":null,"inventors":[],"filing_date":"2015-02-11T00:00:00.000Z","publication_date":"2017-04-04T00:00:00.000Z","cpc_codes":["G06F","G06F","G06F","G06F","G06F","G06F","G06Q","G06Q","G06Q"],"num_claims":12,"abstract":"An extreme ultraviolet (EUV) mask blank production system includes: a substrate handling vacuum chamber for creating a vacuum; a substrate handling platform, in the vacuum, for transporting an ultra-low expansion substrate loaded in the substrate handling vacuum chamber; and multiple sub-chambers, accessed by the substrate handling platform, for forming an EUV mask blank includes: a multi-layer stack, formed above the ultra-low expansion substrate, for reflecting an extreme ultraviolet (EUV) light, and an absorber layer, formed above the multi-layer stack, for absorbing the EUV light at a wavelength of 13.5 nm includes the absorber layer has a thickness of less than 80 nm and less than 2% reflectivity."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor","description":"An extreme ultraviolet (EUV) mask blank production system includes: a substrate handling vacuum chamber for creating a vacuum; a substrate handling platform, in the vacuum, for transporting an ultra-l","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9612522","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9612522","citation_suggestion":"Patentable. \"Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor\" (US-9612522). https://patentable.app/patents/US-9612522","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9612522","json":"https://patentable.app/api/llm-context/US-9612522","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T07:04:15.468Z"}