{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9613807","patent":{"patent_number":"US-9613807","title":"Methods for fabricating integrated circuits using directed self-assembly chemoepitaxy","assignee":null,"inventors":[],"filing_date":"2015-04-21T00:00:00.000Z","publication_date":"2017-04-04T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L"],"num_claims":8,"abstract":"Methods for directed self-assembly (DSA) using chemoepitaxy in the design and fabrication of integrated circuits are disclosed herein. An exemplary method includes forming an A or B-block attracting layer over a base semiconductor layer, forming a trench in the A or B-block attracting layer to expose a portion of the base semiconductor layer, and forming a neutral brush or mat or SAMs layer coating within the trench and over the base semiconductor layer. The method further includes forming a block copolymer layer over the neutral layer coating and over the A or B-block attracting layer and annealing the block copolymer layer to form a plurality of vertically-oriented, cylindrical structures within the block copolymer layer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Methods for fabricating integrated circuits using directed self-assembly chemoepitaxy","description":"Methods for directed self-assembly (DSA) using chemoepitaxy in the design and fabrication of integrated circuits are disclosed herein. An exemplary method includes forming an A or B-block attracting l","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9613807","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9613807","citation_suggestion":"Patentable. \"Methods for fabricating integrated circuits using directed self-assembly chemoepitaxy\" (US-9613807). https://patentable.app/patents/US-9613807","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9613807","json":"https://patentable.app/api/llm-context/US-9613807","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T10:34:00.170Z"}