{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9613808","patent":{"patent_number":"US-9613808","title":"Method of forming multilayer hard mask with treatment for removing impurities and forming dangling bonds","assignee":null,"inventors":[],"filing_date":"2016-01-19T00:00:00.000Z","publication_date":"2017-04-04T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":7,"abstract":"A method of forming a multilayer hard mask includes the following steps. An unpatterned multilayer hard mask is formed on a semiconductor substrate. The unpatterned multilayer hard mask includes a first hard mask layer formed on the semiconductor substrate and a second hard mask layer directly formed on the first hard mask layer. A treatment is performed on a top surface of the first hard mask layer before the step of forming the second hard mask layer, and the treatment is configured to remove impurities on the first hard mask layer and form dangling bonds on the top surface of the first hard mask layer. Defects related to the first hard mask layer and the second hard mask layer may be reduced, and the manufacturing yield may be enhanced accordingly."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of forming multilayer hard mask with treatment for removing impurities and forming dangling bonds","description":"A method of forming a multilayer hard mask includes the following steps. An unpatterned multilayer hard mask is formed on a semiconductor substrate. The unpatterned multilayer hard mask includes a fir","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9613808","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9613808","citation_suggestion":"Patentable. \"Method of forming multilayer hard mask with treatment for removing impurities and forming dangling bonds\" (US-9613808). https://patentable.app/patents/US-9613808","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9613808","json":"https://patentable.app/api/llm-context/US-9613808","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T06:11:00.921Z"}