{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9616545","patent":{"patent_number":"US-9616545","title":"Exhaust flow rate control apparatus and substrate processing apparatus provided therewith","assignee":null,"inventors":[],"filing_date":"2014-09-25T00:00:00.000Z","publication_date":"2017-04-11T00:00:00.000Z","cpc_codes":["G05D"],"num_claims":7,"abstract":"The present invention is intended to set the temperature of a predetermined location inside a processing space in which a polishing pad is disposed to within a predetermined temperature range. A substrate processing apparatus includes a CMP apparatus and an exhaust flow rate control apparatus configured to exhaust a polishing space in which the CMP apparatus is disposed. The exhaust flow rate control apparatus is provided with a first exhaust line, a first exhaust flow rate-variable device and an exhaust control unit. The exhaust control unit includes a storage device storing control data on previously-calculated exhaust flow rates necessary to set the temperature of a predetermined location of the CMP apparatus."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Exhaust flow rate control apparatus and substrate processing apparatus provided therewith","description":"The present invention is intended to set the temperature of a predetermined location inside a processing space in which a polishing pad is disposed to within a predetermined temperature range. A subst","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9616545","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9616545","citation_suggestion":"Patentable. \"Exhaust flow rate control apparatus and substrate processing apparatus provided therewith\" (US-9616545). https://patentable.app/patents/US-9616545","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9616545","json":"https://patentable.app/api/llm-context/US-9616545","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T07:01:12.041Z"}