{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9617636","patent":{"patent_number":"US-9617636","title":"System and method for controlling wafer and thin film surface temperature","assignee":null,"inventors":[],"filing_date":"2015-08-31T00:00:00.000Z","publication_date":"2017-04-11T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L"],"num_claims":13,"abstract":"A vapor deposition system and its wafer and thin-film temperature control method are disclosed. A susceptor carries a plurality of wafer holders with each bearing a wafer. The susceptor makes revolution around a center axle and each wafer holder rotates around its own axis. A carrier gas approaches a first surface of the wafer and is heated to form a thin film to be deposited on the first surface. An isothermal plate is placed at a second surface of the wafer and the second surface is opposite to the first surface. One or more remote temperature-measuring elements measure a temperature of a rear surface of the isothermal plate and the rear surface is opposite to the wafer, and a wafer-side temperature is calculated by the measured rear surface temperature of the isothermal plate."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"System and method for controlling wafer and thin film surface temperature","description":"A vapor deposition system and its wafer and thin-film temperature control method are disclosed. A susceptor carries a plurality of wafer holders with each bearing a wafer. The susceptor makes revoluti","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9617636","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9617636","citation_suggestion":"Patentable. \"System and method for controlling wafer and thin film surface temperature\" (US-9617636). https://patentable.app/patents/US-9617636","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9617636","json":"https://patentable.app/api/llm-context/US-9617636","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T12:20:34.456Z"}