{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9619878","patent":{"patent_number":"US-9619878","title":"Inspecting high-resolution photolithography masks","assignee":null,"inventors":[],"filing_date":"2014-04-11T00:00:00.000Z","publication_date":"2017-04-11T00:00:00.000Z","cpc_codes":["G06T","G01N","G01N","G06T","G06T"],"num_claims":20,"abstract":"Optical inspection methods and apparatus for high-resolution photomasks using only a test image. A filter is applied to an image signal received from radiation that is transmitted by or reflected from a photomask having a test image. The filter may be implemented using programmed control to adjust and control filter conditions, illumination conditions, and magnification conditions."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Inspecting high-resolution photolithography masks","description":"Optical inspection methods and apparatus for high-resolution photomasks using only a test image. A filter is applied to an image signal received from radiation that is transmitted by or reflected from","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9619878","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9619878","citation_suggestion":"Patentable. \"Inspecting high-resolution photolithography masks\" (US-9619878). https://patentable.app/patents/US-9619878","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9619878","json":"https://patentable.app/api/llm-context/US-9619878","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T12:04:30.590Z"}