{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9620383","patent":{"patent_number":"US-9620383","title":"Method for uncovering underlying alignment patterns","assignee":null,"inventors":[],"filing_date":"2015-07-09T00:00:00.000Z","publication_date":"2017-04-11T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L"],"num_claims":18,"abstract":"Techniques disclosed herein include methods and systems for clearing out films or materials that may be covering alignment marks on substrates such as semiconductor wafers. Such films include photoresist layers, polymer films, thin films, and other layers that may be opaque or semi-opaque to optical alignment systems. A solvent composition is printed directly on resist films or other patterning films at specified points or regions on a substrate. The solvent composition printed or deposited on a resist film then begins to dissolve portions of the resist film that are directly underneath the solvent composition. The solvent composition and dissolved film material is then removed or washed from the substrate without causing other portions of the resist film to be dissolved, thereby uncovering alignment patterns or marks."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for uncovering underlying alignment patterns","description":"Techniques disclosed herein include methods and systems for clearing out films or materials that may be covering alignment marks on substrates such as semiconductor wafers. Such films include photores","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9620383","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9620383","citation_suggestion":"Patentable. \"Method for uncovering underlying alignment patterns\" (US-9620383). https://patentable.app/patents/US-9620383","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9620383","json":"https://patentable.app/api/llm-context/US-9620383","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T06:45:37.184Z"}