{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9623435","patent":{"patent_number":"US-9623435","title":"Substrate processing apparatus for coating liquid composed of first coating liquid and second coating liquid on substrate with slit-shaped ejection port","assignee":null,"inventors":[],"filing_date":"2015-07-30T00:00:00.000Z","publication_date":"2017-04-18T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L"],"num_claims":11,"abstract":"Disclosed is a substrate processing apparatus. The substrate processing apparatus includes a moving mechanism that moves a wafer in a horizontal direction, coating sections that eject the coating liquid to the wafer, and dry sections that dries the coating liquid, and a controller that controls the drying sections, the coating sections, and the moving mechanism. In each coating section, the wafer is moved in the horizontal direction while causing the coating liquid to be in contact with the wafer so that the coating liquid is coated on the entire surface."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Substrate processing apparatus for coating liquid composed of first coating liquid and second coating liquid on substrate with slit-shaped ejection port","description":"Disclosed is a substrate processing apparatus. The substrate processing apparatus includes a moving mechanism that moves a wafer in a horizontal direction, coating sections that eject the coating liqu","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9623435","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9623435","citation_suggestion":"Patentable. \"Substrate processing apparatus for coating liquid composed of first coating liquid and second coating liquid on substrate with slit-shaped ejection port\" (US-9623435). https://patentable.app/patents/US-9623435","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9623435","json":"https://patentable.app/api/llm-context/US-9623435","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T05:19:09.162Z"}