{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9624356","patent":{"patent_number":"US-9624356","title":"Ultraviolet absorber, composition for forming a resist under layer film, and patterning process","assignee":null,"inventors":[],"filing_date":"2015-07-08T00:00:00.000Z","publication_date":"2017-04-18T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L"],"num_claims":17,"abstract":"The present invention provides an ultraviolet absorber containing a compound represented by the formula (A-1),wherein R represents a methyl group, an ethyl group, a propyl group, or an allyl group, and R1, R2, R3, and R4 may be the same or different, and each represent a hydrogen atom, a benzoyl group, a toluoyl group, a naphthoyl group, or an anthranoyl group. By adding the ultraviolet absorber to a composition for forming a resist under layer film, reflection can be suppressed particularly in lithography process by an ultraviolet laser, and a pattern profile can be improved without adverse effects on dry etching mask properties and adhesiveness to a resist pattern."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Ultraviolet absorber, composition for forming a resist under layer film, and patterning process","description":"The present invention provides an ultraviolet absorber containing a compound represented by the formula (A-1),wherein R represents a methyl group, an ethyl group, a propyl group, or an allyl group, an","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9624356","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9624356","citation_suggestion":"Patentable. \"Ultraviolet absorber, composition for forming a resist under layer film, and patterning process\" (US-9624356). https://patentable.app/patents/US-9624356","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9624356","json":"https://patentable.app/api/llm-context/US-9624356","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T11:40:08.833Z"}