{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9625809","patent":{"patent_number":"US-9625809","title":"Method and system for forming patterns using charged particle beam lithography with variable pattern dosage","assignee":null,"inventors":[],"filing_date":"2016-06-16T00:00:00.000Z","publication_date":"2017-04-18T00:00:00.000Z","cpc_codes":["B82Y","B82Y","G06F","G06F","G06F"],"num_claims":18,"abstract":"A method and system for fracturing or mask data preparation or optical proximity correction or proximity effect correction or mask process correction is disclosed in which a set of shaped beam shots is determined that is capable of forming a pattern on a surface, where the set of shots provides different dosages to different parts of the pattern, and where the dose margin from the set of shots is calculated. A method for forming patterns on a surface is also disclosed."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method and system for forming patterns using charged particle beam lithography with variable pattern dosage","description":"A method and system for fracturing or mask data preparation or optical proximity correction or proximity effect correction or mask process correction is disclosed in which a set of shaped beam shots i","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9625809","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9625809","citation_suggestion":"Patentable. \"Method and system for forming patterns using charged particle beam lithography with variable pattern dosage\" (US-9625809). https://patentable.app/patents/US-9625809","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9625809","json":"https://patentable.app/api/llm-context/US-9625809","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T11:39:24.108Z"}