{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9625831","patent":{"patent_number":"US-9625831","title":"Exposure apparatus, exposure method and manufacturing method of semiconductor device","assignee":null,"inventors":[],"filing_date":"2016-02-09T00:00:00.000Z","publication_date":"2017-04-18T00:00:00.000Z","cpc_codes":["H01L"],"num_claims":20,"abstract":"According to one embodiment, a controller calculates wafer alignment residuals from results of wafer alignment measurement and calculates shape change displacement residuals from the surface shape of a wafer. Further, the controller calculates first conversion coefficients that are ratios of the wafer alignment residuals to the shape change displacement residuals and generates fine wafer alignment residual data by using the first conversion coefficients. Furthermore, the controller generates correction information in which first correction values at the time of the exposure processing are calculated for every shot on the wafer by using the fine wafer alignment residual data. Then, the controller controls exposure processing in an exposure unit by using the correction information corresponding to the shot of the wafer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Exposure apparatus, exposure method and manufacturing method of semiconductor device","description":"According to one embodiment, a controller calculates wafer alignment residuals from results of wafer alignment measurement and calculates shape change displacement residuals from the surface shape of ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9625831","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9625831","citation_suggestion":"Patentable. \"Exposure apparatus, exposure method and manufacturing method of semiconductor device\" (US-9625831). https://patentable.app/patents/US-9625831","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9625831","json":"https://patentable.app/api/llm-context/US-9625831","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T19:49:39.730Z"}