{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9640446","patent":{"patent_number":"US-9640446","title":"Semiconductor structure and fabrication method thereof","assignee":null,"inventors":[],"filing_date":"2015-11-20T00:00:00.000Z","publication_date":"2017-05-02T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":17,"abstract":"A method for fabricating a semiconductor structure is provided. The method includes providing a semiconductor substrate; and forming a plurality of semiconductor devices on the semiconductor substrate. The method also includes forming a dielectric layer covering the plurality of the semiconductor devices on the semiconductor substrate; and forming an optical auxiliary layer configured to reflect a portion of a levelness-detecting light and absorb a portion of the levelness detecting light transmitting through the optical auxiliary layer during a levelness-detecting process over the dielectric layer. Further, the method includes forming a photoresist layer over the optical auxiliary layer; and detecting a levelness of the semiconductor substrate and exposing the photoresist layer to form a patterned photoresist layer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Semiconductor structure and fabrication method thereof","description":"A method for fabricating a semiconductor structure is provided. The method includes providing a semiconductor substrate; and forming a plurality of semiconductor devices on the semiconductor substrate","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9640446","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9640446","citation_suggestion":"Patentable. \"Semiconductor structure and fabrication method thereof\" (US-9640446). https://patentable.app/patents/US-9640446","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9640446","json":"https://patentable.app/api/llm-context/US-9640446","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T05:48:34.564Z"}