{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9650544","patent":{"patent_number":"US-9650544","title":"Polishing composition, method for manufacturing polishing composition, and method for manufacturing polishing composition liquid concentrate","assignee":null,"inventors":[],"filing_date":"2013-08-12T00:00:00.000Z","publication_date":"2017-05-16T00:00:00.000Z","cpc_codes":["H01L"],"num_claims":6,"abstract":"A polishing composition contains silicon dioxide, a water-soluble polymer, and water. An adsorbate containing at least part of the water-soluble polymer is adsorbed on the silicon dioxide. The adsorbate is contained in a concentration of 4 ppm by mass or more in terms of carbon. A percentage of the concentration of the adsorbate in terms of carbon relative to a total carbon concentration in the polishing composition is 15% or more."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Polishing composition, method for manufacturing polishing composition, and method for manufacturing polishing composition liquid concentrate","description":"A polishing composition contains silicon dioxide, a water-soluble polymer, and water. An adsorbate containing at least part of the water-soluble polymer is adsorbed on the silicon dioxide. The adsorba","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9650544","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9650544","citation_suggestion":"Patentable. \"Polishing composition, method for manufacturing polishing composition, and method for manufacturing polishing composition liquid concentrate\" (US-9650544). https://patentable.app/patents/US-9650544","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9650544","json":"https://patentable.app/api/llm-context/US-9650544","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T05:36:46.187Z"}