{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9653571","patent":{"patent_number":"US-9653571","title":"Freestanding spacer having sub-lithographic lateral dimension and method of forming same","assignee":null,"inventors":[],"filing_date":"2015-06-15T00:00:00.000Z","publication_date":"2017-05-16T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":20,"abstract":"An aspect of the invention includes a freestanding spacer having a sub-lithographic dimension for a sidewall image transfer process. The freestanding spacer comprises: a first spacer layer having a first portion disposed on the semiconductor layer; and a second spacer layer having a first surface disposed on the first portion of the first spacer layer, wherein the first spacer layer has a first dielectric constant and the second spacer layer has a second dielectric constant, the first dielectric constant being greater than the second dielectric constant, and wherein a dimension of each of the first and second spacer layers collectively determine the sub-lithographic lateral dimension of the freestanding spacer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Freestanding spacer having sub-lithographic lateral dimension and method of forming same","description":"An aspect of the invention includes a freestanding spacer having a sub-lithographic dimension for a sidewall image transfer process. The freestanding spacer comprises: a first spacer layer having a fi","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9653571","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9653571","citation_suggestion":"Patentable. \"Freestanding spacer having sub-lithographic lateral dimension and method of forming same\" (US-9653571). https://patentable.app/patents/US-9653571","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9653571","json":"https://patentable.app/api/llm-context/US-9653571","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T10:58:10.115Z"}