{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9659141","patent":{"patent_number":"US-9659141","title":"EDA tool and method for conflict detection during multi-patterning lithography","assignee":null,"inventors":[],"filing_date":"2015-08-24T00:00:00.000Z","publication_date":"2017-05-23T00:00:00.000Z","cpc_codes":["G06F","G06F"],"num_claims":20,"abstract":"A method includes accessing data representing a layout of a layer of an integrated circuit (IC) having a plurality of polygons defining circuit patterns to be divided among a number (N) of photomasks over a single layer of a semiconductor substrate, where N is greater than two. The method further includes inputting a conflict graph having a plurality of vertices, identifying a first and second vertex, each of which is connected to a third and fourth vertex where the third and fourth vertices are connected to a same edge of a conflict graph, and merging the first and second vertices to form a reduced graph. The method further includes detecting at least one or more vertex in the reduced having a conflict. In one aspect, the method resolves the detected conflict by performing one of pattern shifting, stitch inserting, or re-routing."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"EDA tool and method for conflict detection during multi-patterning lithography","description":"A method includes accessing data representing a layout of a layer of an integrated circuit (IC) having a plurality of polygons defining circuit patterns to be divided among a number (N) of photomasks ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9659141","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9659141","citation_suggestion":"Patentable. \"EDA tool and method for conflict detection during multi-patterning lithography\" (US-9659141). https://patentable.app/patents/US-9659141","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9659141","json":"https://patentable.app/api/llm-context/US-9659141","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T15:59:46.276Z"}