{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9673200","patent":{"patent_number":"US-9673200","title":"Semiconductor device structure and method of manufacturing the same","assignee":null,"inventors":[],"filing_date":"2016-01-29T00:00:00.000Z","publication_date":"2017-06-06T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":17,"abstract":"A method for forming a semiconductor device structure is provided. The method includes forming a first gate stack structure and a second gate stack structure on a substrate, and the first gate stack structure includes a first spacer adjacent to the second gate stack structure. The method also includes forming an U-shaped capping layer between the first gate stack structure and the second gate stack structure, and a lateral sidewall of the U-shaped capping layer is in direct contact with the first spacer of the first gate stack structure. A top of the lateral sidewall of the U-shaped capping layer is below a top of the first spacer of the first gate stack structure."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Semiconductor device structure and method of manufacturing the same","description":"A method for forming a semiconductor device structure is provided. The method includes forming a first gate stack structure and a second gate stack structure on a substrate, and the first gate stack s","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9673200","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9673200","citation_suggestion":"Patentable. \"Semiconductor device structure and method of manufacturing the same\" (US-9673200). https://patentable.app/patents/US-9673200","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9673200","json":"https://patentable.app/api/llm-context/US-9673200","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T16:20:25.164Z"}