{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9673206","patent":{"patent_number":"US-9673206","title":"Buried hard mask for embedded semiconductor device patterning","assignee":null,"inventors":[],"filing_date":"2016-04-19T00:00:00.000Z","publication_date":"2017-06-06T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L"],"num_claims":20,"abstract":"Methods and apparatus for manufacturing semiconductor devices, and such semiconductor devices, are described. According to various aspects of the disclosure, a semiconductor device comprises a first region, a second region, a first polysilicon region, and a second polysilicon region. The first polysilicon region is formed over the first and second regions of the semiconductor device. Portions of the first and polysilicon layers that are uncovered by either of a first mask and a second mask are removed. The first mask is formed on the first polysilicon layer and the second mask is formed on the second polysilicon layer in the first region and not on in the second region."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Buried hard mask for embedded semiconductor device patterning","description":"Methods and apparatus for manufacturing semiconductor devices, and such semiconductor devices, are described. According to various aspects of the disclosure, a semiconductor device comprises a first r","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9673206","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9673206","citation_suggestion":"Patentable. \"Buried hard mask for embedded semiconductor device patterning\" (US-9673206). https://patentable.app/patents/US-9673206","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9673206","json":"https://patentable.app/api/llm-context/US-9673206","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T17:27:31.878Z"}