{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9679095","patent":{"patent_number":"US-9679095","title":"Layout decomposition for multiple patterning lithography","assignee":null,"inventors":[],"filing_date":"2014-09-22T00:00:00.000Z","publication_date":"2017-06-13T00:00:00.000Z","cpc_codes":["G06F","G06F","G06F","G06F","G06F"],"num_claims":18,"abstract":"Aspects of the disclosed techniques relate to techniques of layout decomposition for multiple patterning lithography. Data of a coloring graph are derived from layout data for a layout design. The coloring graph is simplified by repeatedly applying a plurality of graph simplification units. Each of the graph simplification units is configured to use a unique approach to simplify a graph. Based on the simplified coloring graph, the layout design is decomposed to generate decomposition information. The decomposition process may comprise applying a heuristic method for coloring if needed. The decomposition information may comprise information of one or more layout regions that cannot be decomposed."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Layout decomposition for multiple patterning lithography","description":"Aspects of the disclosed techniques relate to techniques of layout decomposition for multiple patterning lithography. Data of a coloring graph are derived from layout data for a layout design. The col","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9679095","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9679095","citation_suggestion":"Patentable. \"Layout decomposition for multiple patterning lithography\" (US-9679095). https://patentable.app/patents/US-9679095","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9679095","json":"https://patentable.app/api/llm-context/US-9679095","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T11:45:49.050Z"}