{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9679803","patent":{"patent_number":"US-9679803","title":"Method for forming different patterns in a semiconductor structure using a single mask","assignee":null,"inventors":[],"filing_date":"2014-01-13T00:00:00.000Z","publication_date":"2017-06-13T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L"],"num_claims":20,"abstract":"The present disclosure provides a method for forming an integrated circuit (IC) structure. The method comprises providing a semiconductor structure including a substrate, a dielectric layer formed over the substrate, and a hard mask region formed over the dielectric layer; forming a first photoresist layer over the hard mask region; performing a first lithography exposure using a photomask to form a first latent pattern; forming a second photoresist layer over the hard mask region; and performing a second lithography exposure using the photomask to form a second latent pattern. The photomask includes a first mask feature and a second mask feature. The first latent pattern corresponds to the first mask feature, and the second latent pattern corresponds to the first mask feature and the second mask feature."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for forming different patterns in a semiconductor structure using a single mask","description":"The present disclosure provides a method for forming an integrated circuit (IC) structure. The method comprises providing a semiconductor structure including a substrate, a dielectric layer formed ove","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9679803","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9679803","citation_suggestion":"Patentable. \"Method for forming different patterns in a semiconductor structure using a single mask\" (US-9679803). https://patentable.app/patents/US-9679803","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9679803","json":"https://patentable.app/api/llm-context/US-9679803","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T14:38:16.099Z"}