{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9679844","patent":{"patent_number":"US-9679844","title":"Manufacturing a damascene thin-film resistor","assignee":null,"inventors":[],"filing_date":"2016-06-16T00:00:00.000Z","publication_date":"2017-06-13T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L"],"num_claims":9,"abstract":"In some embodiments of the present disclosure, a method for manufacturing a thin film resistor after completing a copper chemical mechanical polishing (CMP) process on a copper process module may include: depositing a dielectric barrier layer across at least two structures; depositing a second dielectric layer atop the dielectric barrier as a hard mask; patterning a trench using photo lithography; etching the trench through the hard mask and stopping in or on the dielectric barrier; removing any remaining photoresist from the photo lithography process; etching the trench through the dielectric barrier thereby exposing a copper surface for each of the at least two copper structures; and depositing thin-film resistor material into the trench and bridging across the resulting at least two exposed copper surfaces."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Manufacturing a damascene thin-film resistor","description":"In some embodiments of the present disclosure, a method for manufacturing a thin film resistor after completing a copper chemical mechanical polishing (CMP) process on a copper process module may incl","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9679844","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9679844","citation_suggestion":"Patentable. \"Manufacturing a damascene thin-film resistor\" (US-9679844). https://patentable.app/patents/US-9679844","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9679844","json":"https://patentable.app/api/llm-context/US-9679844","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T11:45:45.136Z"}