{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9683956","patent":{"patent_number":"US-9683956","title":"Method of manufacturing nano gap sensor using residual stress and nano gap sensor manufactured thereby","assignee":null,"inventors":[],"filing_date":"2015-06-25T00:00:00.000Z","publication_date":"2017-06-20T00:00:00.000Z","cpc_codes":["G01N","G01N","G01N","G01N","H01L"],"num_claims":9,"abstract":"Provided are a method of manufacturing a nano gap sensor and a nano gap sensor manufactured by the method. According to the method of manufacturing the nano gap sensor, fine cracks are formed in a substrate including a silicon wafer, etc. in order to form the nano gap with simplified processes and low manufacturing costs, and after that, a metal catalyst layer is stacked on the nano gap to manufacture a sensor capable of selectively detecting a certain material or a gas such as hydrogen. In particular, when palladium or a palladium alloy is used as the metal catalyst layer, highly sensitive hydrogen sensors capable of responding various concentrations of hydrogen may be produced in large quantities."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of manufacturing nano gap sensor using residual stress and nano gap sensor manufactured thereby","description":"Provided are a method of manufacturing a nano gap sensor and a nano gap sensor manufactured by the method. According to the method of manufacturing the nano gap sensor, fine cracks are formed in a sub","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9683956","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9683956","citation_suggestion":"Patentable. \"Method of manufacturing nano gap sensor using residual stress and nano gap sensor manufactured thereby\" (US-9683956). https://patentable.app/patents/US-9683956","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9683956","json":"https://patentable.app/api/llm-context/US-9683956","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T05:02:56.323Z"}