{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9684236","patent":{"patent_number":"US-9684236","title":"Method of patterning a film layer","assignee":null,"inventors":[],"filing_date":"2016-03-17T00:00:00.000Z","publication_date":"2017-06-20T00:00:00.000Z","cpc_codes":["B82Y","H01L","H01L","H01L","H01L","H01L","B82Y"],"num_claims":20,"abstract":"A method of fabricating a semiconductor device is disclosed. The method includes forming a first patterned hard mask over a material layer. The first patterned hard mask defines an opening. The method also includes forming a direct-self-assembly (DSA) layer having a first portion and a second portion within the opening, removing the first portion of the DSA layer, forming spacers along sidewalls of the second portion of the DSA layer and removing the second portion of the DSA layer. The spacers form a second patterned hard mask over the material layer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of patterning a film layer","description":"A method of fabricating a semiconductor device is disclosed. The method includes forming a first patterned hard mask over a material layer. The first patterned hard mask defines an opening. The method","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9684236","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9684236","citation_suggestion":"Patentable. \"Method of patterning a film layer\" (US-9684236). https://patentable.app/patents/US-9684236","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9684236","json":"https://patentable.app/api/llm-context/US-9684236","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T03:51:18.853Z"}