{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9685374","patent":{"patent_number":"US-9685374","title":"Contact process flow","assignee":null,"inventors":[],"filing_date":"2016-04-12T00:00:00.000Z","publication_date":"2017-06-20T00:00:00.000Z","cpc_codes":["H01L"],"num_claims":20,"abstract":"Embodiments described herein generally relate to forming a semiconductor structure. In one embodiment, a method of forming a semiconductor structure is formed herein. The method includes exposing an oxide layer of the semiconductor structure, depositing a polysilicon layer on the semiconductor structure, filling a first gap formed by exposing the oxide layer, depositing a hard mask on the polysilicon layer, selectively removing the hard mask and the polysilicon layer, depositing an oxide layer on the semiconductor structure, filling a second gap formed by selectively removing the hard mask and polysilicon layer, exposing the polysilicon layer deposited on the semiconductor structure, selectively removing the polysilicon layer from the first gap, and selectively removing an etch stop layer from a surface of a contact in the semiconductor structure."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Contact process flow","description":"Embodiments described herein generally relate to forming a semiconductor structure. In one embodiment, a method of forming a semiconductor structure is formed herein. The method includes exposing an o","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9685374","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9685374","citation_suggestion":"Patentable. \"Contact process flow\" (US-9685374). https://patentable.app/patents/US-9685374","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9685374","json":"https://patentable.app/api/llm-context/US-9685374","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T07:02:53.795Z"}