{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9691615","patent":{"patent_number":"US-9691615","title":"Chemoepitaxy-based directed self assembly process with tone inversion for unidirectional wiring","assignee":null,"inventors":[],"filing_date":"2015-08-28T00:00:00.000Z","publication_date":"2017-06-27T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":20,"abstract":"After forming a material stack including, from bottom to top, a dielectric material layer, a transfer layer, a hard mask layer and a neutral layer over a substrate, the neutral layer and the hard mask layer is patterned to create trenches therein that correspond to areas where unnecessary lines generated by a self-assembly of a self-assembling material subsequently formed and/or unnecessary portions of such lines are present. The self-assembling material is applied over the top surfaces of the patterned neutral layer and the transfer layer to form a self-aligned lamellar structure including alternating first and second domains. The second domains are removed selective to the first domains to provide a directed self-assembly (DSA) pattern of the first domains. Portions of the first domains not intersecting the trenches can be transferred into the patterned hard mask layer, resulting in a composite pattern of a pattern of trenches and the DSA pattern."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Chemoepitaxy-based directed self assembly process with tone inversion for unidirectional wiring","description":"After forming a material stack including, from bottom to top, a dielectric material layer, a transfer layer, a hard mask layer and a neutral layer over a substrate, the neutral layer and the hard mask","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9691615","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9691615","citation_suggestion":"Patentable. \"Chemoepitaxy-based directed self assembly process with tone inversion for unidirectional wiring\" (US-9691615). https://patentable.app/patents/US-9691615","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9691615","json":"https://patentable.app/api/llm-context/US-9691615","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T05:51:31.808Z"}