{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9691714","patent":{"patent_number":"US-9691714","title":"Semiconductor device and method for manufacturing semiconductor device","assignee":null,"inventors":[],"filing_date":"2015-11-30T00:00:00.000Z","publication_date":"2017-06-27T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L"],"num_claims":10,"abstract":"A semiconductor device of the present invention includes a first interlayer film having a first region and a second region, a MIM structure including a lower electrode formed on the second region, a first capacitance film formed on the lower electrode, and an upper electrode formed on the first capacitance film, a lower metal layer formed on the first region, and disposed in the same layer level with the lower electrode, an auxiliary metal layer disposed in the same layer level with the upper electrode, and opposed to the lower metal layer, a second interlayer film formed on the first interlayer film, and covering the auxiliary metal layer and the MIM structure, and a top metal layer formed on the second interlayer film, and penetrating through the second interlayer film to contact the auxiliary metal layer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Semiconductor device and method for manufacturing semiconductor device","description":"A semiconductor device of the present invention includes a first interlayer film having a first region and a second region, a MIM structure including a lower electrode formed on the second region, a f","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9691714","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9691714","citation_suggestion":"Patentable. \"Semiconductor device and method for manufacturing semiconductor device\" (US-9691714). https://patentable.app/patents/US-9691714","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9691714","json":"https://patentable.app/api/llm-context/US-9691714","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T15:18:09.910Z"}