{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9691935","patent":{"patent_number":"US-9691935","title":"Impurity-diffusing composition and method for producing semiconductor element","assignee":null,"inventors":[],"filing_date":"2014-06-30T00:00:00.000Z","publication_date":"2017-06-27T00:00:00.000Z","cpc_codes":["H01L","H01L"],"num_claims":10,"abstract":"An impurity-diffusing composition including (A) a polysiloxane represented by Formula (1) and (B) an impurity diffusion component.In the formula, R1 represents an aryl group having 6 to 15 carbon atoms, and a plurality of R1 may be the same or different. R2 represents any of a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an acyl group having 2 to 6 carbon atoms, and an aryl group having 6 to 15 carbon atoms, and a plurality of R2 may be the same or different. R3 and R4 each represent any of a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, and an acyl group having 2 to 6 carbon atoms, and a plurality of R3 and a plurality of R4 each may be the same or different. The ratio of n:m is 95:5 to 25:75."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Impurity-diffusing composition and method for producing semiconductor element","description":"An impurity-diffusing composition including (A) a polysiloxane represented by Formula (1) and (B) an impurity diffusion component.In the formula, R1 represents an aryl group having 6 to 15 carbon atom","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9691935","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9691935","citation_suggestion":"Patentable. \"Impurity-diffusing composition and method for producing semiconductor element\" (US-9691935). https://patentable.app/patents/US-9691935","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9691935","json":"https://patentable.app/api/llm-context/US-9691935","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T10:53:40.330Z"}