{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9698048","patent":{"patent_number":"US-9698048","title":"Method of fabricating semiconductor device","assignee":null,"inventors":[],"filing_date":"2016-02-24T00:00:00.000Z","publication_date":"2017-07-04T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":20,"abstract":"A method for fabricating a semiconductor device includes forming a first material layer over a substrate, forming a middle layer over the first material layer, forming a first hard mask (HM) layer over the middle layer, forming a second HM layer over the first HM layer, forming a first trench in the second HM layer that extends into the first HM layer, forming a second trench in the second HM layer, The second trench is parallel to the first trench. The method also includes forming a first hole feature in the middle layer within the first trench by using the second HM layer and the first HM layer as a mask and forming a second hole feature in the middle layer within the second trench by using the second HM layer as a mask."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of fabricating semiconductor device","description":"A method for fabricating a semiconductor device includes forming a first material layer over a substrate, forming a middle layer over the first material layer, forming a first hard mask (HM) layer ove","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9698048","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9698048","citation_suggestion":"Patentable. \"Method of fabricating semiconductor device\" (US-9698048). https://patentable.app/patents/US-9698048","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9698048","json":"https://patentable.app/api/llm-context/US-9698048","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T05:51:19.677Z"}