{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9698229","patent":{"patent_number":"US-9698229","title":"Semiconductor structure and process thereof","assignee":null,"inventors":[],"filing_date":"2012-01-17T00:00:00.000Z","publication_date":"2017-07-04T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":4,"abstract":"A semiconductor structure includes at least a fin-shaped structure, a gate, a source/drain region, an interdielectric layer and an epitaxial structure. At least a fin-shaped structure is located on a bottom substrate. The gate covers the fin-shaped structure. The source/drain region is located in the fin-shaped structure next to the gate. The interdielectric layer covers the gate and the fin-shaped structure, wherein the interdielectric layer has a plurality of contact holes, respectively exposing at least a part of the source/drain region. The epitaxial structure is located in each of the contact holes, directly contacts and is only located on the source/drain region. Additionally, a semiconductor process formed said semiconductor structure is also provided."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Semiconductor structure and process thereof","description":"A semiconductor structure includes at least a fin-shaped structure, a gate, a source/drain region, an interdielectric layer and an epitaxial structure. At least a fin-shaped structure is located on a ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9698229","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9698229","citation_suggestion":"Patentable. \"Semiconductor structure and process thereof\" (US-9698229). https://patentable.app/patents/US-9698229","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9698229","json":"https://patentable.app/api/llm-context/US-9698229","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T10:53:36.242Z"}