{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9703912","patent":{"patent_number":"US-9703912","title":"Mask set, fabrication method of mask set, manufacturing method of semiconductor device, and recording medium","assignee":null,"inventors":[],"filing_date":"2015-06-23T00:00:00.000Z","publication_date":"2017-07-11T00:00:00.000Z","cpc_codes":["G06F","G06F"],"num_claims":20,"abstract":"According to one embodiment, there is provided a mask set including a first mask and a second mask. The first mask includes a first device pattern and a first mark pattern. The first mark pattern is used for an inspection of a position of the first device pattern on a surface of the first mask. The second mask is used to perform multiple exposure on a substrate together with the first mask. The second mask includes a second device pattern and a second mark pattern. The second mark pattern is used for an inspection of a position of the second device pattern on a surface of the second mask. The second mark pattern includes a pattern corresponding to a pattern obtained by inverting the first mark pattern."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Mask set, fabrication method of mask set, manufacturing method of semiconductor device, and recording medium","description":"According to one embodiment, there is provided a mask set including a first mask and a second mask. The first mask includes a first device pattern and a first mark pattern. The first mark pattern is u","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9703912","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9703912","citation_suggestion":"Patentable. \"Mask set, fabrication method of mask set, manufacturing method of semiconductor device, and recording medium\" (US-9703912). https://patentable.app/patents/US-9703912","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9703912","json":"https://patentable.app/api/llm-context/US-9703912","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T15:42:43.764Z"}