{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9710903","patent":{"patent_number":"US-9710903","title":"System and method for detecting design and process defects on a wafer using process monitoring features","assignee":null,"inventors":[],"filing_date":"2009-06-05T00:00:00.000Z","publication_date":"2017-07-18T00:00:00.000Z","cpc_codes":["G06T","G06F","H01L","G01N","G06T","G06T","H01L"],"num_claims":50,"abstract":"Various systems and methods for detecting design and process defects on a wafer, reviewing defects on a wafer, selecting one or more features within a design for use as process monitoring features, or some combination thereof are provided. One system is configured to detect design defects and process defects at locations on a wafer at which images are acquired by an electron beam review subsystem based on defects in a design, additional defects in the design, which are detected by comparing an image of a die in the design printed on the wafer acquired by the electron beam review subsystem to an image of the die stored in a database, and defects detected on the wafer by a wafer inspection system."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"System and method for detecting design and process defects on a wafer using process monitoring features","description":"Various systems and methods for detecting design and process defects on a wafer, reviewing defects on a wafer, selecting one or more features within a design for use as process monitoring features, or","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9710903","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9710903","citation_suggestion":"Patentable. \"System and method for detecting design and process defects on a wafer using process monitoring features\" (US-9710903). https://patentable.app/patents/US-9710903","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9710903","json":"https://patentable.app/api/llm-context/US-9710903","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T10:20:03.113Z"}