{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9711394","patent":{"patent_number":"US-9711394","title":"Method for cleaning the surface of an epitaxial layer in openings of semiconductor device","assignee":null,"inventors":[],"filing_date":"2016-05-23T00:00:00.000Z","publication_date":"2017-07-18T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L"],"num_claims":11,"abstract":"A method for fabricating a semiconductor device includes the following steps: providing a substrate having an epitaxial layer, a gate structure and an interlayer dielectric thereon, where the epitaxial structure is disposed at sides of the gate structure and the interlayer dielectric covering the epitaxial structure; forming an opening in the interlayer dielectric so that the surface of the epitaxial layer is exposed from the bottom of the opening; performing a rapid thermal process in an inert environment until non-conductive material is generated on the surface of the epitaxial layer; and removing the non-conductive material."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for cleaning the surface of an epitaxial layer in openings of semiconductor device","description":"A method for fabricating a semiconductor device includes the following steps: providing a substrate having an epitaxial layer, a gate structure and an interlayer dielectric thereon, where the epitaxia","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9711394","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9711394","citation_suggestion":"Patentable. \"Method for cleaning the surface of an epitaxial layer in openings of semiconductor device\" (US-9711394). https://patentable.app/patents/US-9711394","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9711394","json":"https://patentable.app/api/llm-context/US-9711394","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T08:23:30.149Z"}