{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9721817","patent":{"patent_number":"US-9721817","title":"Apparatus for measuring impurities on wafer and method of measuring impurities on wafer","assignee":null,"inventors":[],"filing_date":"2016-09-07T00:00:00.000Z","publication_date":"2017-08-01T00:00:00.000Z","cpc_codes":["H01L","G01N","G01N","G01N","H01L","H01L","H01L","H01L","G01N","G01N"],"num_claims":6,"abstract":"Provided are an apparatus for measuring impurities on a wafer and a method of measuring impurities on a wafer. The apparatus includes: a wafer aligning device for aligning a wafer; a loading robot for moving and loading the aligned wafer; a rotation stage for rotating the loaded wafer; a scan robot for holding a natural oxide layer etching solution for the wafer and a metallic impurity recovery solution; and a container for receiving a predetermined etching solution and a recovery solution, wherein the scan robot removes an oxide layer on an edge region of the wafer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Apparatus for measuring impurities on wafer and method of measuring impurities on wafer","description":"Provided are an apparatus for measuring impurities on a wafer and a method of measuring impurities on a wafer. The apparatus includes: a wafer aligning device for aligning a wafer; a loading robot for","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9721817","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9721817","citation_suggestion":"Patentable. \"Apparatus for measuring impurities on wafer and method of measuring impurities on wafer\" (US-9721817). https://patentable.app/patents/US-9721817","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9721817","json":"https://patentable.app/api/llm-context/US-9721817","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T04:58:32.681Z"}