{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9721830","patent":{"patent_number":"US-9721830","title":"Methods of manufacturing semiconductor devices including isolation layers","assignee":null,"inventors":[],"filing_date":"2016-05-06T00:00:00.000Z","publication_date":"2017-08-01T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":14,"abstract":"A method of manufacturing a semiconductor device comprising the steps of: forming a trench at an upper portion of a semiconductor substrate forming a preliminary filling insulation layer by coating a siloxane composition on the semiconductor substrate to fill the trench performing a low temperature curing process at a temperature in a range from about 50° C. to about 150° C. such that the preliminary filling insulation layer is transformed into a filling insulation layer including polysiloxane and forming an isolation layer by planarizing the filling insulation layer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Methods of manufacturing semiconductor devices including isolation layers","description":"A method of manufacturing a semiconductor device comprising the steps of: forming a trench at an upper portion of a semiconductor substrate forming a preliminary filling insulation layer by coating a ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9721830","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9721830","citation_suggestion":"Patentable. \"Methods of manufacturing semiconductor devices including isolation layers\" (US-9721830). https://patentable.app/patents/US-9721830","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9721830","json":"https://patentable.app/api/llm-context/US-9721830","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T07:20:55.511Z"}