{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9728406","patent":{"patent_number":"US-9728406","title":"Multi materials and selective removal enabled reverse tone process","assignee":null,"inventors":[],"filing_date":"2015-08-04T00:00:00.000Z","publication_date":"2017-08-08T00:00:00.000Z","cpc_codes":["H01L","H01L"],"num_claims":20,"abstract":"Embodiments described herein generally relate to methods for device patterning. In various embodiments, a plurality of protrusions and gaps are formed on a substrate, and each gap is formed between adjacent protrusions. Each protrusion includes a first line, a second line and a third line. The first and third lines include a first material, and the second lines include a second material that is different from the first material. A fourth line is deposited in each gap and the fourth line includes a third material that is different than the first and second materials. Because the first, second and third materials are different, one or more lines can be removed by selective etching while adjacent lines that are made of a different material may not be covered by a mask. The critical dimensions (CD) and the edge displacement errors (EPE) of the mask are increased."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Multi materials and selective removal enabled reverse tone process","description":"Embodiments described herein generally relate to methods for device patterning. In various embodiments, a plurality of protrusions and gaps are formed on a substrate, and each gap is formed between ad","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9728406","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9728406","citation_suggestion":"Patentable. \"Multi materials and selective removal enabled reverse tone process\" (US-9728406). https://patentable.app/patents/US-9728406","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9728406","json":"https://patentable.app/api/llm-context/US-9728406","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T15:33:18.635Z"}