{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9741614","patent":{"patent_number":"US-9741614","title":"Method of preventing trench distortion","assignee":null,"inventors":[],"filing_date":"2016-07-11T00:00:00.000Z","publication_date":"2017-08-22T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L"],"num_claims":17,"abstract":"A method of forming trenches and a via by self-aligned double patterning includes providing a dielectric layer covered by an SiOC layer, a TiN layer and a SiON layer from top to bottom. At least two mandrels are formed on the SiOC layer. Later, two spacers are formed respectively at two sidewalls of each mandrel. Subsequently, the mandrels are removed. The SiOC layer and the TiN layer are patterned by using the spacers to form numerous recesses. The spacers are then removed. A mask layer with a via pattern is formed to cover the SiOC layer. A via is formed in the dielectric layer by taking the mask layer as a mask. After that, the mask layer is removed. Finally, numerous trenches are formed in the dielectric layer by taking the SiOC layer and the TiN layer as a mask."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of preventing trench distortion","description":"A method of forming trenches and a via by self-aligned double patterning includes providing a dielectric layer covered by an SiOC layer, a TiN layer and a SiON layer from top to bottom. At least two m","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9741614","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9741614","citation_suggestion":"Patentable. \"Method of preventing trench distortion\" (US-9741614). https://patentable.app/patents/US-9741614","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9741614","json":"https://patentable.app/api/llm-context/US-9741614","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T06:24:39.303Z"}