{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9741739","patent":{"patent_number":"US-9741739","title":"Semiconductor manufacturing method and semiconductor device","assignee":null,"inventors":[],"filing_date":"2016-09-14T00:00:00.000Z","publication_date":"2017-08-22T00:00:00.000Z","cpc_codes":["H01L"],"num_claims":16,"abstract":"A semiconductor manufacturing method includes alternately stacking first films and second films to form a stack film. The method includes forming a plurality of recessed portions in a stack direction of the stack film at an interval in a first direction substantially perpendicular to the stack direction. The semiconductor manufacturing method includes forming third films in the recessed portions. The method includes forming a mask material on the stack film and the third films and diminishing the mask material to expose the stack film in a first range between an end of a stepped portion to be formed on the stack film and one of the third films and to position an end of the mask material on the third film. The method includes removing a predetermined number of layers of films from the stack film in the first range using the diminished mask material as a mask."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Semiconductor manufacturing method and semiconductor device","description":"A semiconductor manufacturing method includes alternately stacking first films and second films to form a stack film. The method includes forming a plurality of recessed portions in a stack direction ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9741739","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9741739","citation_suggestion":"Patentable. \"Semiconductor manufacturing method and semiconductor device\" (US-9741739). https://patentable.app/patents/US-9741739","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9741739","json":"https://patentable.app/api/llm-context/US-9741739","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T16:30:56.006Z"}