{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9746772","patent":{"patent_number":"US-9746772","title":"Resist underlayer film forming composition for lithography containing polyether structure-containing resin","assignee":null,"inventors":[],"filing_date":"2016-07-08T00:00:00.000Z","publication_date":"2017-08-29T00:00:00.000Z","cpc_codes":["H01L","H01L"],"num_claims":9,"abstract":"A method for producing a semiconductor device, which includes forming an underlayer film on a semiconductor substrate with a resist underlayer film forming composition that contains a solvent, and a polymer containing a unit structure of Formula (2):O—Ar2—O—Ar3-T-Ar4  Formula (2)where Ar2, Ar3, and Ar4 are individually a C6-50 arylene group or an organic group containing a heterocyclic group; at least one of Ar3 and Ar4 is a phenylene group; and T is a carbonyl group. The resist underlayer film forming composition has a solid content of 0.1 to 70 mass % of a total mass of the composition."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Resist underlayer film forming composition for lithography containing polyether structure-containing resin","description":"A method for producing a semiconductor device, which includes forming an underlayer film on a semiconductor substrate with a resist underlayer film forming composition that contains a solvent, and a p","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9746772","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9746772","citation_suggestion":"Patentable. \"Resist underlayer film forming composition for lithography containing polyether structure-containing resin\" (US-9746772). https://patentable.app/patents/US-9746772","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9746772","json":"https://patentable.app/api/llm-context/US-9746772","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T08:02:35.332Z"}