{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-9747408","patent":{"patent_number":"US-9747408","title":"Generating final mask pattern by performing inverse beam technology process","assignee":null,"inventors":[],"filing_date":"2015-08-21T00:00:00.000Z","publication_date":"2017-08-29T00:00:00.000Z","cpc_codes":["G06F","G06F","G06F","G06F"],"num_claims":20,"abstract":"The present disclosure provides an integrated circuit (IC) method in accordance with some embodiments. The method includes receiving an IC design layout; and performing an inverse beam technology (IBT) process to the IC design layout, thereby generating a final mask pattern, wherein the IBT process uses a single IBT model to simulate both a mask making process and a wafer making process."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Generating final mask pattern by performing inverse beam technology process","description":"The present disclosure provides an integrated circuit (IC) method in accordance with some embodiments. The method includes receiving an IC design layout; and performing an inverse beam technology (IBT","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-9747408","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-9747408","citation_suggestion":"Patentable. \"Generating final mask pattern by performing inverse beam technology process\" (US-9747408). https://patentable.app/patents/US-9747408","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-9747408","json":"https://patentable.app/api/llm-context/US-9747408","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-06-06T05:15:35.138Z"}